Temperature dependence of refractive index of SiO2 glass
Abstract The refractive index of silica glass has been measured in the UV and visible regions from −165 4 to 83 3°C The wavelength dispersion at each temperature was fitted by the three term Sellmeier equation Analysis of the Sellmeier equation shows that the temperature dependence of the refractive index originates from the temperature shift of the observed shift of the exciton peak at
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Refractive Index of SiO2 Fused Silica Silica Silicon
For a typical sample of SiO2 the refractive index and extinction coefficient at 632 8 nm are 1 45704 and 0 Below are files of complete refractive index and extinction coefficients Below are files of complete refractive index and extinction coefficients
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Temperature dependence of refractive index of SiO2 glass
The index data are fitted with a three term Sellmeier dispersion equation which is derived from the I rentz oscil lator model which correlates absorption and re fractive index This equation gives the refractive index of SiO2 glass to a good approximation in the UV visible and near IR regions 1
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Refractive index of SiO Silicon monoxide Hass
k = 0 Created with Highcharts 5 0 14 Wavelength µm n k Chart context menu 2 5 5 7 5 10 12 5 0 0 5 1 1 5 2 2 5 3 RefractiveIndex SiO Silicon monoxide Hass and Salzberg 1954 n k 0 24 14 0 µm n k LogX LogY eV
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Refractive index tuning of SiO2 for Long Range Surface
Refractive index of SiO 2 thin film can be lowered to match with the refractive index of water 1 33 by depositing its nanostructures owing to the fact that the feature size of nanostructures are less as compared to the wavelength of incident visible light thereby reducing the Rayleigh and Mie scattering Xi et al 2007 The reduction in both these scatterings leads to increased transmission of the incident visible light and hence the effective refractive index
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Silica Spheres and Particles from Applied Physics Inc
SiO2 particles are available in 15ml volumes or 100ml volumes The refractive index of Silica particles is similar to PSL refractive index Silica particle Refractive Index is n=1 46 while Polystyrene Latex PSL refractive index is n=1 585 both measured at 633 nm laser wavelength
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Refractive index tuning of SiO2 for Long Range Surface
SiO 2 having tunable refractive index is used as dielectric layer for excitation of long range surface plasmon modes Growth parameters of SiO 2 thin film was optimized to obtain low refractive value of 1 33 Si/SiO 2 /Au/uricase uric acid/prism LRSPR sensor structure is utilized to detect uric acid Concentration 0 05 mM1 mM The developed LRSPR sensor illustrated high sensitivity
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Oxford ICP CVD SiO2Princeton University
The lowest refractive index for ICP CVD SiO2 deposited in the presence of RIE power of 20 W is 1 473 and can not be reduced more due to limited N2O flow of 100 sccmin the system 1 465
Get PriceAcoustic velocities and refractive index of SiO2 glass to
The hypersonic sound velocity and refractive index of SiO2 glass has been measured to 57 5 GPa at room temperature by Brillouin scattering in diamond cells On compression both longitudinal and tranverse modes exhibit an anomalous change in slope in the low pressure region Between 12 and 23 GPa the sound velocities increase rapidly
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Refractive Index DatabaseTable of Refractive Index
Refractive Index Database The table below contains links to refractive index data for common materials Each material in the database has refractive index listed as a function of wavelength over a range typically required for thin film thickness measurement λ nm
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Refractive index of SiO2 Silicon dioxide Silica Quartz
n = 1 4585 Extinction coefficient i k = Created with Highcharts 5 0 14 Wavelength µm n k Chart context menu 2 4 6 1 1 1 15 1 2 1 25 1 3 1 35 1 4 1 45 1 5 1 55 1 6 RefractiveIndex SiO2 Silicon dioxide Silica Quartz Malitson 1965 Fused silica n 0 21 6 7 µm n k LogX LogY eV
Get PriceSilica Glass SiO2 Optical Material
Silica Glass SiO2 Fused Silica is a hard high temperature pure glass Fused Silica is used for UV and visible components Infra red grades of Fused Silica are available for NIR use To download this data as a pdf file or to download our MSDS safety data sheet please click on the links at the top of the page
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Temperature dependence of refractive index of glassy SiO2
An interferometric method was used for the determination of refractive index of glassy SiO2 in the infrared IR wavelength region 1 44<λ<4 77 μm at temperatures ranging from 23 5 to 481°C by IR spectroscopy The refractive index was found to increase with temperature at a given wavelength
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OSA Study of refractive index of GeO2 SiO2 mixtures
Refractive indices of deposited thin films of amorphous GeO2 SiO2 mixtures were determined by multimode optical waveguide measurement techniques at four different wavelengths and used to characterize waveguide properties as a function of material composition The results indicate that the refractive index varies linearly with the mole fraction of GeO2 in the guide while wavelength
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Refractive index behavior of SiO2 P2O5 glass in optical
The refractive index of SiO 2 P 2 O 5 glass prepared by a modified chemical vapor deposition method is measured using an interference microscope It is found that the refractive index in bulk form increases linearly at 9 5 10 4 mol 1 as the P 2 O 5 concentration increases It is also found that quenching at extremely high speed reduces the refractive index over 2 mol P 2 O 5
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Refractive index determination of SiO2 layer in the UV/Vis
Keywords SiO2 thin film optical properties refractive index determination 1INTRODUCTION The determination of the complex refractive index refractive index n and extinction coefficient k of thin films is of great importance for the design and production of any optical in terference filters Successful manufacturing of such filters is
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Refractive Index of SiO2 Films Grown on Silicon Journal
By more precise variable angle monochromatic fringe observation VAMFO it has been found possible to improve the precision of thickness determinations of transparent thin films 800 Å to several microns on reflective substrates to better than 0 1 and to extend the determination of the refractive index to films as thin as 900 Å The measured refractive
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OSA Thickness and refractive index measurement of a
We have proposed and demonstrated a novel method that can determine both the geometrical thickness and refractive index of a silicon wafer at the same time using an optical comb The geometrical thickness and refractive index of a silicon wafer was determined from the optical thickness using phase information obtained in the spectral domain In a feasibility test the geometrical thickness and
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Thin films composed of SiO2 nanorods or nanoporous SiO2 np SiO2 are attractive for use as a low refractive index material in various types of optical coatings However the material properties of these films are unstable because of the high porosity of the films This is particularly apparent in dry versus humid atmospheres where both the refractive index and coefficient of thermal expansion
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Temperature dependence of refractive index of glassy SiO2
An interferometric method was used for the determination of refractive index of glassy SiO 2 in the infrared IR wavelength region 1 44<λ<4 77 μm at temperatures ranging from 23 5 to 481°C by IR spectroscopy The refractive index was found to increase with temperature at a given wavelength
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OSA Interspecimen Comparison of the Refractive Index of
The index of refraction of optical quality fused silica SiO2 was determined for 60 wavelengths from 0 21 to 3 71 μ at 20°C The dispersion equation n2 1=0 λ2λ2 0 2 0 λ2λ2 0 2 0 λ2λ2 9 896161 2 where λ is expressed in microns was found to yield an absolute residual of 10 5 10−6 The variation in index between 12 specimens was determined
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Oxford ICP CVD SiO2Princeton University
The lowest refractive index for ICP CVD SiO2 deposited in the presence of RIE power of 20 W is 1 473 and can not be reduced more due to limited N2O flow of 100 sccmin the system 1 465
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Refractive indices of SiO2 and GeO2 based glasses near
Conclusion SiO2 and GeO2 based ternary glass systems were studied in order to establish the relation between the refractive index and the composition The material constants which appear in the disper sion formula vary linearly with the percentage of network forming cations Si4 or Ge4
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OSA Refractive index of thin films of SiO2 ZrO2 and
Series of amorphous SiO2 ZrO2 and HfO2 films were prepared by electron beam evaporation at various oxygen pressures such that the packing density varied from 0 6 to 0 82 Transmittance spectra were evaluated with respect to thickness and refractive index by application of analytical formulas to the interference extrema and by dielectric modeling
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Silica Glass SiO2 Optical Material
Silica Glass SiO2 Fused Silica is a hard high temperature pure glass Fused Silica is used for UV and visible components Infra red grades of Fused Silica are available for NIR use To download this data as a pdf file or to download our MSDS safety data sheet please click on the links at the top of the page
Get PriceTemperature dependent refractive index of silicon and
Table 1 Uncertainty in absolute refractive index measure nents of silicon for selected wavelengths and temperatures 1Absolute refractive index of Silicon with temperature 1 0 0 1 O 2 0 3 0 4 0 5 0 6 0 wavelength microns Figure 1 Measured absolute refractive index of silicon as a fi nction of wavelength for selected temperatures
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Fused Silica Silica Silicon
SiO2 Fused Silica Silica Silicon Dioxide Thermal Oxide ThermalOxide I H Malitson 1965 Interspecimen Comparison of the Refractive Index of Fused Silica JOSA Vol 55 Issue 10 pp doi 10 1364
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Refractive Index of SiO2 Films Grown on Silicon Journal
The measured refractive indices at 5459 Å of silicon dioxide films grown in steam and/or dry oxygen atmosphere pressure at 980° to 1200°C varied from 1 461 0
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Stress and Refractive Index Control of SiO2 Thin Films for
nanomaterials Article Stress and Refractive Index Control of SiO2 Thin Films for Suspended Waveguides Neal Wostbrock 1 2 and Tito Busani 2 3 1 Department of Nanoscience and Microsystems Engineering School of Engineering University of New Mexico MSC01 1120 Albuquerque NM USA nwostbrock unm edu
Get PriceStress and Refractive Index Control of SiO2 Thin Films for
Film stress and refractive index play an important role in the fabrication of suspended waveguides SiO2 waveguides were successfully fabricated on multiple substrates including Si Ge and Al2O3 wafers the waveguides were deposited using inductively coupled plasma chemical vapor deposition at 100 °C The precursor gases were SiH4 and N2O at 1 3 and 1 9 ratios with variable flow rates
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